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Please use this identifier to cite or link to this item: http://dspace.bsu.edu.ru/handle/123456789/4728
Title: The effect that nitrogen ion irradiation and the deposition of a nanosize-thick carbon coating have on microhardness and crack-growth resistance in silicon
Authors: Kolpakov, A. Ya.
Druchinina, O. A.
Kharchenko, V. A.
Keywords: equipment
chemical production
silicon wafers
ions
nitrogen ions
carbon coating
compressive stresses
resistance silicon
silicon
Issue Date: 2009
Citation: The effect that nitrogen ion irradiation and the deposition of a nanosize-thick carbon coating have on microhardness and crack-growth resistance in silicon / A.Ya. Kolpakov, O.A. Druchinina, V.A. Kharchenko ; Belgorod State University // Nanotechnologies in Russia. - 2009. - Vol.4, N3-4.-P. 166-169.. - doi: 10.1134/S1995078009030033.
Abstract: The behavior of silicon wafers in the starting state (after both irradiation with nitrogen ions and after nitrogen ion irradiation and the deposition of an 80-nm-thick carbon coating) has been investigated
URI: http://dspace.bsu.edu.ru/handle/123456789/4728
Appears in Collections:Статьи из периодических изданий и сборников (на иностранных языках) = Articles from periodicals and collections (in foreign languages)

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